Summary
Abstract
The resistance of thirty two strains of Escherichia coli O157:H7 and six major serotypes of non-O157 shiga toxin-producing E. coli (STEC) plus E. coli O104:H4 was tested against electrolyzed oxidizing (EO) water using two different methods; modified AOAC 955.16 sequential inoculation method and minimum inhibitory concentration (MIC). In sequential inoculation method efficacy of sodium hypochlorite was also compared with equal free chlorine (45 mg/L) containing EO water. MIC experiments were conducted for 15 s testing period with free chlorine concentrations of 3.00, 2.50, 2.00, 1.50, 1.00, 0.50 and 0.25 mg/L. The individual strain resistance when tested using the sequential inoculation method was in between 5 and 10 positive tubes, where greater numbers of positive tubes indicate increased resistance of the respective strain to the particular sanitizer. The MIC of individual strains ranged from 0.50 to 1.50 mg/L free chlorine of EO water. In comparison to sodium hypochlorite at same free chlorine concentration EO water was more effective against all STEC cocktails tested. The resistance of STEC cocktails using sequential inoculation method was determined as E. coli O157 O103 O26 0111 O121 045 > O145. The similar pattern of resistance was observed when cocktails were subjected to MIC. The results indicate that different strains of same serotype can differ in their resistance toward an intervention. In addition, EO water treatment that reduces E. coli O157:H7 can equally if not more effectively reduce other non-O157 STEC tested.
Study details
- Published in: Food Control 30.2 (2013): 580-584
- Microbes studied: Escherichia coli O157:H7
Source
Source: Food Control 30.2 (2013): 580-584
Conditions tested
| Parameter | Value |
|---|---|
| Organisms | Escherichia coli |
| Relevant sectors | Food Processing |
| Publication | Food Control, 2013 |
Reading this responsibly
Published figures are obtained under controlled conditions, usually on clean surfaces or in defined matrices. Organic load, surface condition, temperature and application coverage all affect real-world performance. Use these numbers to design a protocol, then validate it on your own site with environmental swabbing.
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